Other recent product releases:

11 March 2010 - Launch of new Canon REALiS LCOS Projector

09 March 2010 - Dual-Wavelength Laser Source Covers a Wide Wavelength Range

02 March 2010 - TECHSPEC® Single Axis Crossed-Roller Translation Stages Provide High Accuracy, Rigidity and Load Capacity

25 February 2010 - Edmund Optics® Introduces TECHSPEC® Near UV Achromatic Lenses

24 February 2010 - Epilog Laser Releases Zing 24 Rotary Attachment

15 February 2010 - TECHSPEC® Hot and Cold Mirrors Feature Multi-Layer Dielectric Coating

20 January 2010 - Altman’s 4-Channel LED Entertainment Lights Deliver 281 Trillion Colors

12 January 2010 - New Optical Design Software Released by Optical Engineering Firm Breault Research

05 January 2010 - Edmund Optics Acquires Ealing’s Reflecting Objectives Product Line

02 November 2009 - Edmund Optics Releases New S-Mounts for Small Optics Offering Short Working Distance for Optimal Performance

24 September 2009 - Gradient Index Rod Lenses Offer Micro Lens Alternative to Aspherical Singlets

08 September 2009 - Edmund Optics TE Cooled CCD Based Spectrometers

16 July 2009 - Edmund Optics Introduces IR Right Angle Prisms

09 March 2009 - GC780/GC780C New Low Cost Gigabit Ethernet Camera 64 fps from Prosilica

06 March 2009 - New Broadband Fibre-to-Fibre Isolators ...

Veeco Introduces Dimension Icon Atomic Force Microscope

Veeco Instruments Inc. (Nasdaq: VECO), provider of atomic force microscopes (AFMs) to the nanoscience community, announced today the release of its Dimension® Icon™ AFM. Building upon the world’s most utilized large-sample AFM platform, the latest member of Veeco’s Dimension product line delivers the highest resolution, best ease-of-use, and fastest time-to-results of any large-sample AFM on the market today. The Dimension Icon brings new levels of performance, ease and productivity to researchers using AFM throughout nanoscale science and industry.

Veeco’s Dimension Icon represents a new generation of high-performance, easy-to-use AFM, having been engineered from the ground up to incorporate all of our latest AFM modes and techniques,” said Mark R. Munch, Ph.D., Executive Vice President, Veeco Metrology.
The Icon is the first large-sample AFM specifically designed to address atomic force microscopy needs of both the research lab and industrial applications. With the Icon AFM, our customers can, more simply than ever, perform analysis ranging from quantitative automated characterization to atomic scale imaging across our core markets of material science, semiconductor, data storage, and energy research.”

According to one of the Icon AFM’s beta users, Professor Ralf Seemann of Saarland University, Germany, “The Icon provides high-quality data more easily, and in a shorter period of time, than any other AFM that we have used.

David Rossi, Vice President and General Manager of Veeco’s AFM Business Unit, commented, “Based upon the excellent reviews that the Icon AFM’s best-in-class performance and intuitive graphical user interface have received from our beta customers, we anticipate broad adoption of this platform in both research and industry. A major goal behind the creation of the Icon was to lower the barrier to entry for high-level AFM research, and to bring this technology into the mainstream of microscopy. We are confident that the Dimension Icon AFM will enable our customers to push the limits of their work.”

 

Source: Veeco (Press Release).
Date: 02 February 2009